Comparison ledger
Nikon 1505 G 6 E, Ultratech XLS 7800, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | XLS 7800Ultratech |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Ultratech XLS 7800 |
| Specifications | ||
| Configuration | 5" reticle[1] | — |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | XLS 7800[4] |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | 0.51[6] |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Manufacturer | — | Ultratech[4] |
| Wafer sizes | — | 6 inch[4] |
| Wafer diameter(s) | — | 200 mm[5] |
| Wafer holder | — | ceramic vacuum chuck[5] |
| Wafer materials | — | silicon[5] |
| Wafer thickness | — | 700 .. 750 µm[5] |
| Laser source | — | 248nm[6] |
| Optical reduction | — | 4X reduction[6] |
| Field size | — | full field (22 squared mm)[6] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →