Comparison ledger
Nikon NSR 2005 i 9 C i-Line, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000 FamilyUltratech | |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | Standard PDP 11/93 Computer & Silicon Carbide Wafer Loader Type 1 Conversion on it | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2005 | Ultratech 1000 Family |
| Specifications | ||
| Configuration | HDD & Software included[1] | — |
| Wafer size | Standard PDP 11/93 Computer & Silicon Carbide Wafer Loader Type 1 Conversion on it[1] | — |
| Reticle | 6", normal thickness[3] | — |
| Wafer | 8", OF direction 0*, Ring type wafer[3] | — |
| Lens type | 5iB3[3] | — |
| Magnification | 1/5[3] | 1X[6] |
| Field size | 21.2 x 25.2mm[3] | — |
| Lamp power | 1750 KW[3] | — |
| Light source | Mercury lamp[3] | — |
| Reticle Alignment | i-line, CCD imagining[3] | — |
| Make | Nikon[1] | — |
| Model | NSR 2005 i 9 C[1] | — |
| Reticle Size | 6 inch[1] | — |
| Numerical Aperture (NA) | 0.57 (selectable <0.57 >0.57)[5] | — |
| Exposure Light | i-line[5] | — |
| Sigma | 0.56 – 0.80[5] | — |
| Alignment Light | HeNe Laser, Halogen Lamp[5] | — |
| Alignment Method | CCD imaging + image processing[5] | — |
| Alignment Mode | LSA (HeNe laser) or FIA (halogen lamp)[5] | — |
| XY Stage Drive Method | Ball screw drive & two-axis interferometer[5] | — |
| XY Stage Stroke X | −115 mm to +150 mm[5] | — |
| XY Stage Stroke Y | −160 mm to +115 mm[5] | — |
| Auto Focus Method | Halogen lamp + AF line sensor[5] | — |
| Wafer Leveling | Two-axis ball screw drive[5] | — |
| Chamber Set Temperature | 23 °C[5] | — |
| Camera Type | CCD[5] | — |
| Power Supply | 208 V, 3 Phase[4] | — |
| CE Mark Certified | Yes[4] | — |
| Handler Type | Prealign II[4] | — |
| Power | 208 V, 3 Phase[4] | — |
| Manuals Included | Partial[4] | — |
| # of Cassette / FOUP Loaders | Cassette Stage[4] | — |
| Robot Type | OEM[4] | — |
| End Effecter Type | OEM[4] | — |
| Handler Options | SiC Substrate[4] | — |
| System SW (OS) Version | Nikon Nest[4] | — |
| Supporting Equipment | STD OEM Items[4] | — |
| CDA | N2[4] | — |
| DIW | Chilled Water[4] | — |
| PC Model | Present (original PC type)[5] | — |
| Hard Disk | Original[5] | — |
| NEST Upgrade | Version: NEST-2[5] | — |
| Wafer Size (6 inch) | 6 inch[4] | — |
| Wafer Size (8 inch) | 8 inch[3] | — |
| Numerical Aperture | 0.57 (range <0.57 >0.57 selectable)[5] | — |
| Sigma Range | 0.56 – 0.80[5] | — |
| Wafer Alignment Methods | LSA (HeNe laser), FIA (halogen lamp)[5] | — |
| Chamber Temperature Set | 23 °C[5] | — |
| Camera / Vision | CCD Type[5] | — |
| Computer (some units) | Standard PDP 11/93[1] | — |
| Wafer Loader (some units) | Silicon Carbide Wafer Loader Type 1 Conversion[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[6] |
| Optical design | — | Wynne Dyson[6] |
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