Waferpedia

Comparison ledger

SS W 80 A-ARversus1000P

SCREEN SS W 80 A-AR, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size200mm—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySCREEN SS W 80YES 1000P
Specifications
ConfigurationFully upgraded DNS SS-W80A-AR:[1]Parallel plate[3]
Wafer size200mm Notch Standard Silicon Wafer Substrate (Left to Right wafer flow)[1]—
MakeSCREEN / DNS[1]—
ModelSS W 80 A-AR[1]1000P[2]
Wafer Sizes8 inch[1]—
Scrubbing Units2 front, 2 back side[1]—
Reverse Units2[1]—
DI Water RinseIncluded[1]—
Back RinseIncluded[1]—
Brush RinseIncluded[1]—
Nano DIW with N2Included[1]—
Wafer substrate200mm notch standard silicon wafer substrate[1]—
CommunicationSECS II or GEM included[1]—
Wafer log trackingReal time wafer log tracking system per each wafer[1]—
Auto back-up systemIncluded[1]—
Recipe processingWafer level recipe processing; multi recipe/job processing per cassette (max 25 recipes per 1 cassette)[1]—
Automatic wafer collection featureIncluded[1]—
Auto teaching featureIncluded[1]—
System type—Plasma cleaning system[2]
Shelf configuration—Four 16 x 16 inch shelves[2]
Total capacity—1024 square inches[2]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[2]
Number of shelves—4[2]
Shelf size—16 x 16 inches[2]
Power—1000 W[3]
Operation modes—Active, RIE, Downstream[2]
Sample size range—From smallest semiconductor chip to large flat panels[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]semistarcorp.comsemistarcorp.com