Comparison ledger
SCREEN SU 3200 Single Wafer, Semitool 003163-000 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SU 3200 Single WaferSCREEN | 003163-000 SRDSemitool |
|---|---|---|
| OEM | SCREEN | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SCREEN SU 3200 Single Wafer | Semitool 003163-000 SRD |
| Specifications | ||
| Type | single-wafer cleaner[1] | — |
| Wafer size | 12 inch[2] | — |
| Expandable chambers | up to 12 chambers[1] | — |
| Throughput | up to 800 wafers per hour[1] | — |
| Process compatibility | compatible with processes for 28 nm node and lower[3] | — |
| Make | SCREEN / DNS[2] | Semitool[5] |
| Model | SU 3200[2] | 003163-000[5] |
| Tool type | Single Wafer Cleaner[1] | — |
| Maximum throughput | up to 800 wafers per hour[1] | — |
| Maximum chambers | up to 12 chambers[1] | — |
| Chamber arrangement | 12 chambers in four three-level towers[1] | — |
| Chemical supply system | dynamic direct injection (DDI) or cabinet-type chemical supply system[1] | — |
| Communication protocol | SECS/GEMS[4] | — |
| Wafer handler | Kawasaki robot[4] | — |
| System power rating | 208AC-3 Phase[4] | — |
| Software version | P2485STD00V2485STD00[4] | — |
| Equipment type | — | Spin Rinse Dryer (SRD)[5] |
| Asset # | — | 139375[5] |
| Last Confirm Date | — | September 03, 2025[5] |
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