SCREEN
SU 3200 Single Wafer
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SCREEN SU 3200 Single Wafer is a single-wafer cleaner. The SCREEN SU 3200 Single Wafer processes 12-inch wafers. The SCREEN SU 3200 Single Wafer is compatible with processes for 28 nm node and lower.[1][2]
What it is
How it works
The SU 3200 is expandable to up to twelve processing chambers arranged in four three-level towers. The stacked design and accelerated transport system allow a throughput of up to 800 wafers per hour.[1][4]
The chamber interior volume of the SU 3200 is about one-third that of the preceding model, which improves atmosphere replacement and cleanliness. The chemical supply system is located at the rear of the tool, shortening the path from the chemical source to the wafer. An air balance guide ensures uniform downflow from fan filter units. Proprietary air protection nozzle technology provides watermark-free drying, and advanced splash protection minimizes chemical splash inside the chambers.[1][4]
The SU 3200 uses a Kawasaki robot for wafer handling. The tool supports the SECS/GEMS communication protocol and can be fitted with either a dynamic direct injection or a cabinet-type chemical supply system. The software revision is P2485STD00V2485STD00.[4]
Applications
General reference — not yet source-verifiedThe tool is suitable for both front-end-of-line (FEOL) and back-end-of-line (BEOL) cleaning applications, including pre-diffusion clean, post-etch residue removal, and pre-metal deposition clean.
What do the numbers mean?
Power & electrical1
Wafer handling7
Gas & chemistry1
- Chemical supply system
- dynamic direct injection (DDI) or cabinet-type chemical supply system[1]
Optics & imaging1
Control & software1
Configuration & options7
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
How is contamination controlled in a single-wafer wet processor?General reference — not yet source-verified
The enclosed process chamber and exhaust system contain chemical vapors. The wafer is handled by robot or edge grip to avoid contact with the device side. Recirculation and filtration of chemicals help maintain purity, and the single-wafer nature prevents cross-contamination between different wafers.
Can single-wafer wet processors handle different wafer sizes?General reference — not yet source-verified
Many single-wafer wet processors are designed to accommodate a range of wafer sizes through adjustable chuck or replaceable hardware. The specific wafer size support depends on the tool's configuration, but the class is scalable from small substrates to larger diameters.
Not publicly documented
The following facts about the SU 3200 Single Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SU 3200 Single Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SU 3200 Single Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SU 3200 Single Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SU 3200 Single Wafer are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SU 3200 Single Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]screen.co.jp — screen.co.jpscreen.co.jp
- [2]nanoindustry.su — nanoindustry.sunanoindustry.su
- [3]Equipment inventory listing
- [4]waferpedia.com — waferpedia.comwaferpedia.com
- [5]Equipment inventory listing
Last updated Oct 7, 2026.
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