Waferpedia

Comparison ledger

ACS 300 Gen 2versusPBV-300

SUSS MicroTec ACS 300 Gen 2, YES PBV-300, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
ACS 300 Gen 2SUSS MicroTec
OEMSUSS MicroTecYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec ACS 300YES PBV-300
Specifications
ConfigurationIncludes:[1]—
Wafer sizeSystem tooling for 200/300 mm semi spec wafer sizes[1]300mm and 200mm[5]
OEMSUSS MicroTec[2]—
ModelACS 300 Gen 2[3]—
Equipment typeCoater / Developer[1]—
Automationfully automatic[2]Automated[4]
Architecturemodular[2]—
Process modesspin-coating and spray-coating[2]—
Integrated functionscoat, bake, and develop modules[1]—
Process family—Polyimide/BCB Vacuum Cure Ovens[4]
Associated process applications—polyimide, BCB, low-k dielectrics and copper anneal[4]
Manufacturer—YES[6]
Category—Thermal / Diffusion[6]
Processing range—300mm and 200mm[5]
System type—Fully automated 300mm and 200mm polyimide/BCB/copper anneal/vacuum bake system[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]Equipment inventory listing
  4. [4]web.archive.orgweb.archive.org
  5. [5]web.archive.orgweb.archive.org
  6. [6]waferpedia.comwaferpedia.com