Comparison ledger
Lam Research 4520 Oxide, Nordson March AP 1000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 4520 OxideLam Research | March AP 1000Nordson |
|---|---|---|
| OEM | Lam Research | Nordson |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 | Nordson March |
| Specifications | ||
| Configuration | Refurbished[2] | Includes vacuum pump & RF generator[6] |
| Mounting | Bulkhead[2] | — |
| Software | Envision 1.52[2] | — |
| Indexers | HINE[2] | — |
| AC Box | -002[2] | — |
| Gas Box | Orbital Welded[2] | — |
| Clamping | ESC[2] | — |
| Backside Helium | Closed Loop[2] | — |
| Generator | PDW 2200[2] | — |
| Endpoint | Monochrometer[2] | — |
| MFCs | Unit 1660[2] | — |
| Gas 1 | Ar 1000[2] | — |
| Gas 2 | N2 200[2] | — |
| Gas 3 | O2 200[2] | — |
| Gas 4 | CH4 200[2] | — |
| Gas 5 | CHF3 50[2] | — |
| Gas 6 | SF6 50[2] | — |
| Wafer Size | 200 mm (8 inch) standard, optional 150 mm (6 inch) and 125 mm (5 inch)[2] | — |
| RF Match | LOFAT[2] | — |
| Gas Configuration (example) | Gas 1: Ar 1000 sccm, Gas 2: N2 200 sccm, Gas 3: O2 200 sccm, Gas 4: CH4 200 sccm, Gas 5: CHF3 50 sccm, Gas 6: SF6 50 sccm, Gas 7: O2 1000 sccm[2] | — |
| Power Requirements | 208 V, 50 A, 50/60 Hz[3] | — |
| Dimensions (Width x Depth x Height) | 47.244 in x 98.425 in x 66.929 in (120.0 cm x 250.0 cm x 170.0 cm)[3] | — |
| Weight | 1,764 lb (800 kg)[3] | — |
| Uptime | ≥ 85%[4] | — |
| MTTC (Mean Time to Clean) | < 6 hours[4] | — |
| MTBF (Mean Time Between Failures) | ≥ 125 hours[4] | — |
| MTTR (Mean Time to Repair) | ≤ 4 hours[4] | — |
| Thermal Oxide Etch Rate | ≥ 4500 A/min[4] | — |
| BPSG Etch Rate | > 7500 A/min[4] | — |
| TEOS Etch Rate | > 5000 A/min[4] | — |
| Uniformity | +/- 10% 3σ[4] | — |
| Selectivity (BPSG/TEOS to poly) | > 15:1[4] | — |
| Particles | < 0.08/cm2 at >0.3μm[4] | — |
| Year of Manufacture (example) | 1996[3] | — |
| Gas 7 | O2 1000[2] | — |
| Software Revision | Envision 1.52[2] | — |
| Backside Helium Cooling | Closed loop[2] | — |
| RF Generator | PDW 2200 (2200 watt)[2] | — |
| Endpoint Detection | Monochrometer (enhanced Monochromator for automatic endpoint on exposed oxide)[2] | — |
| Process Gas Types (available) | Ar, CF4, CHF3, O2, CO, SF6, N2, Cl2, HBr, CH3F, He, CH2F2[3] | — |
| Exterior Dimensions (W x D x H) | 120.0 cm x 250.0 cm x 170.0 cm[3] | — |
| Uniformity (3σ) | ± 10%[4] | — |
| Uptime (typical) | ≥ 85%[4] | — |
| Frequency | — | 50 Hz[1] |
| CB Current | — | 25 A[1] |
| SCCR | — | 10 kA[1] |
| RF Generator Power (optional) | — | 600 W or 1000 W (Seren, 13.6 MHz)[7] |
| Vacuum Pump | — | Included (dry or wet pump options)[8] |
| Power | — | 50 Hz[6] |
| Vacuum | — | Included (dry or wet pump options)[6] |
| RF Generator Power | — | 600 W or 1000 W (Seren, 13.6 MHz)[6] |
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