Comparison ledger
SSEC 3302 Resist Removal and Wafer, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000PYES | |
|---|---|---|
| OEM | SSEC | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | Wafer processing modules (2) | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | SSEC 3302 Resist Removal and Wafer | YES 1000P |
| Specifications | ||
| Wafer size | Wafer processing modules (2)[1] | — |
| Voltage | 220V, 3 Ph, 60 Hz, 30A[1] | — |
| Model | — | 1000P[2] |
| System type | — | Plasma cleaning system[2] |
| Shelf configuration | — | Four 16 x 16 inch shelves[2] |
| Total capacity | — | 1024 square inches[2] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[2] |
| Number of shelves | — | 4[2] |
| Shelf size | — | 16 x 16 inches[2] |
| Power | — | 1000 W[3] |
| Configuration | — | Parallel plate[3] |
| Operation modes | — | Active, RIE, Downstream[2] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[2] |
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