Comparison ledger
Tokyo Electron Mark 7, Tokyo Electron Mark 8, Tokyo Electron Mark VIII, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Mark 7Tokyo Electron | Mark 8Tokyo Electron | Mark VIIITokyo Electron |
|---|---|---|---|
| OEM | Tokyo Electron | Tokyo Electron | Tokyo Electron |
| Category | Wet Processing / Clean | Lithography | Resist Processing |
| Wafer size | — | Parallel wafer flow processing software option (simultaneous coat & develop) | — |
| Process node | — | — | — |
| Introduced | — | — | — |
| Production run | — | — | — |
| Lifecycle | — | — | — |
| Lifecycle milestones | — | 1992 Vintage · 1993 Vintage · 1996 Vintage · 1998 Vintage | — |
| Control system | — | — | — |
| Generation | — | — | — |
| Family | Tokyo Electron Mark | Tokyo Electron Mark | Tokyo Electron Mark |
| Cited variants |
|
| |
| Specifications | |||
| Configuration | 1C2D[8] | SOGT[4] | 2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block[10] |
| Wafer size range | 5 inch to 8 inch[9] | — | — |
| Wafer transport | Vacuumless robotic transport[9] | — | — |
| Chuck types | Mechanical and vacuum chucks for top and back side cleaning[9] | — | — |
| Brush control | Automatic brush pressure controller[9] | — | — |
| Optional cleaning | Jet or megasonic cleaning[9] | — | — |
| Host communication | GEM host communication[9] | — | — |
| Interface | SMIF interface[9] | — | — |
| Compliance | S2-93 and CE mark[9] | — | — |
| Vintage | 2011 | — | 1996[10] |
| Coaters & Developers Vintage | 2011 | — | — |
| Wafer size | — | Parallel wafer flow processing software option (simultaneous coat & develop)[5] | — |
| Wafer Size | — | 6 inch, 8 inch[2] | — |
| Configurations | — | Developer, Coater, Coater/Developer[2] | — |
| Vintages | — | 1992, 1993, 1996, 1998[3] | — |
| Coater/Developer Configuration Details | — | 2 coater / 2 developer - Cassette platforms (4) - Coat Modules (2) - Hot Plates (8) - Chill Plates (9) - Wash Disk system (WDS) - A two block system / two robots - Parallel wafer flow processing software option (simultaneous coat & develop) - Semifab CD 200+4TEL Temperature & Humidity Unit - Chemical cabinet containing SMC INR-244-117B Thermocons[5] | — |
| Make | — | Tel[5] | Tel[10] |
| Model | — | Mark 8[5] | Mark VIII[10] |
| Wafer sizes | — | 6 inch[3] | — |
| Cassette platforms | — | 4[5] | — |
| Coat modules | — | 2[5] | — |
| Hot plates | — | 8[5] | 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate[10] |
| Chill plates | — | 9[5] | 4 chill plates[11] |
| Wash disk system | — | WDS[5] | — |
| Robots | — | 2[5] | — |
| Software option | — | Parallel wafer flow processing software option (simultaneous coat & develop)[5] | — |
| Temperature & humidity unit | — | Semifab CD 200+4TEL Temperature & Humidity Unit[5] | — |
| Chemical cabinet contents | — | SMC INR-244-117B Thermocons[5] | — |
| Bulk developer chemical mix station | — | Available for this system[5] | — |
| Gas | — | — | Polyimide[10] |
| OS | — | — | DOS[10] |
| 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame | — | — | Dual Block[7] |
| 2D, 1WEE, 9HP, 3COL - Main Frame | — | — | Dual Block[12] |
| Main Frame | — | — | Single Block[10] |
| Operating System | — | — | DOS 1996 Vintage[10] |
| Equipment type | — | — | Developer[10] |
| Develop cups | — | — | 2[11] |
| Coat cup | — | — | 1[10] |
| Control software | — | — | DOS[10] |
| OEM | — | — | Tokyo Electron[10] |
| Control system / OS | — | — | DOS[10] |
| Type | — | — | Developer[10] |
| Coat Cups | — | — | 1[10] |
| Chill Hot Plates | — | — | 3[10] |
| Low Temp Hot Plates | — | — | 4[10] |
| High Temp Hot Plates | — | — | 1[10] |
| Chill Plates | — | — | 3[11] |
| Process Gases | — | — | Polyimide[10] |
| Vintage Year | — | — | 1996[10] |
| WEE | — | — | Right[11] |
| Process configuration | — | — | 2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS[10] |
| Low temp hot plates | — | — | 3[11] |
| High temp hot plate | — | — | 1[10] |
| WEE Right | — | — | present[11] |
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