Comparison ledger
YES 1000P, YES R1, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000PYES | R1YES |
|---|---|---|
| OEM | YES | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | Legacy |
| Lifecycle milestones | 1998 Acquisition | — |
| Control system | — | — |
| Generation | — | — |
| Family | YES 1000P | YES R1 |
| Cited variants | — |
|
| Specifications | ||
| Model | 1000P[2] | — |
| System type | Plasma cleaning system[2] | — |
| Shelf configuration | Four 16 x 16 inch shelves[2] | — |
| Total capacity | 1024 square inches[2] | — |
| Control system | PLC driven with plain English real time process readout and diagnostics in the event of system abort[2] | — |
| Number of shelves | 4[2] | — |
| Shelf size | 16 x 16 inches[2] | — |
| Power | 1000 W[3] | — |
| Configuration | Parallel plate[3] | — |
| Operation modes | Active, RIE, Downstream[2] | — |
| Sample size range | From smallest semiconductor chip to large flat panels[2] | Small pieces up to 12 in x 12 in x 4 in[5] |
| Plasma clean benchmark | — | 5 minute Argon plasma clean[1] |
| Referenced use | — | Industry standard for 15 years[1] |
| Input power / rating | — | 120 V, 60 Hz, 1.4 A, 175 W[4] |
| Controller | — | Y.E.S. ‘Lark’ Logical Sequencer[4] |
| Plasma power source | — | Plasma-Therm PE-1000, ~1 kW, ~50 kHz, 115 VAC[4] |
| Matching network | — | Advanced Energy LM-5K manual transformer[4] |
| Vacuum pump | — | Fisher Scientific Maxima C Plus Model M2C, KF-16 inlet[4] |
| Process gases | — | Ar or O2[5] |
| Chamber temperature range | — | 25–80 °C (typical, from plasma heat)[5] |
| Maximum substrate size | — | 12 inch[5] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →