Tokyo Electron Clean Track

Models in this family

1. 

   Clean Track Act 12

   The Tokyo Electron Clean Track Act 12 is a coater/developer system for semiconductor wafer processing, available in configurations with multiple coating and developing units and supporting accessories such as temperature and humidity controlled air supply systems.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   CLEAN TRACK ACT 12/8	—	—	—	web.archive.org[1]
   CLEAN TRACK ACT 12 SOD / 8 SOD	—	—	—	web.archive.org[1]

2. Clean Track Act 12 Resist

   The Tel Clean Track Act 12 is a resist coater and developer system for 12-inch wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   12" Single Block	—	—	—	Equipment inventory listing[2]
   12" Multi Block	—	—	—	Equipment inventory listing[3]
   Clean Track Act 12 Single Block	—	—	Single block configuration	Equipment inventory listing[2]
   Clean Track Act 12 Multi Block	—	—	Multi block configuration	Equipment inventory listing[3]

3. 

   Clean Track Act 8produced 1997–

   Tokyo Electron Clean Track Act 8 is an 8-inch coater/developer track with an interface unit for a Canon FPA-3000 i5 stepper and wafer edge exposure.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Clean Track Act 8	—	2001	One source lists 2001 Vintage and another lists 2002 Vintage for the same model.	Equipment inventory listing[4]
   Dual block	—	1999	Dual block configuration, 2C/2D, 6 inch wafers	Equipment inventory listing[5]
   Single block	—	2002	Single block, 8 inch wafers, with interface for Canon stepper	Equipment inventory listing[6]

4. 

   Clean Track Act 8 D

   Tokyo Electron Clean Track Act 8 D is a track system for wet processing in semiconductor manufacturing. Machines of this class handle resist coating, bake, develop, and related wafer cleaning and conditioning steps as part of lithography support.

5. 

   Clean Track Act 8 DUV

   Tokyo Electron Clean Track Act 8 is a DUV clean track system for 8-inch wafers.

6. Clean Track Act 8 Resist

   The Tokyo Electron Clean Track Act 8 is a resist coater and developer for semiconductor wafer processing.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   8" Single Block	—	—	—	Equipment inventory listing[7]
   8" Multi Block	—	—	—	Equipment inventory listing[8]
   6" Single Block	—	—	—	Equipment inventory listing[9]
   Single Block	—	—	—	Equipment inventory listing[7]
   Multi Block	—	—	—	Equipment inventory listing[8]
   Clean Track Act 8 (Single Block)	—	—	Configured as a single-block unit.	Equipment inventory listing[7]
   Clean Track Act 8 (Multi Block)	—	—	Configured as a multi-block unit.	Equipment inventory listing[8]
   Clean Track Act 8 (8 inch, Single Block)	—	—	Single block configuration for 8-inch wafers	Equipment inventory listing[7]
   Clean Track Act 8 (8 inch, Multi Block)	—	—	Multi block configuration for 8-inch wafers	Equipment inventory listing[8]
   Clean Track Act 8 (6 inch, Single Block)	—	—	Single block configuration for 6-inch wafers	Equipment inventory listing[9]

7. 

   Clean Track Lithius

   The Tokyo Electron Clean Track Lithius is a coater/developer system for 200 mm wafers.

8. 

   Clean Track Lithius i+
9. Clean Track Lithius Pro Resist

   The Tokyo Electron Clean Track Lithius Pro is a resist coater and developer designed for 12-inch wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Clean Track Lithius Pro Z	—	—	300mm wafer version	fabsurplus.com[10]

10. Clean Track Lithius Pro V i Resist

    The Clean Track Lithius Pro V i Resist is a resist coater and developer from Tokyo Electron.

11. Clean Track Lithius Pro V Resist

    The Tokyo Electron Clean Track Lithius Pro V is a resist coater/developer for 12-inch wafers, described as a multi-block system.

12. 

    Clean Track Lithius Pro Z i Resist

    Tokyo Electron Clean Track Lithius Pro Z i Resist is a coater/developer system described as a 12-inch multi block tool.

13. Clean Track Lithius Resist

    The Tel Clean Track Lithius Resist Coater / Developer is a resist coater/developer for 12-inch wafers.

    Cited variants

    Designation	Generation	Vintage	Changes	Source
    Clean Track Lithius Resist Coater / Developer — 12" Single Block	—	—	12-inch single-block configuration.	Equipment inventory listing[11]
    Clean Track Lithius Resist Coater / Developer — 12" Single	—	—	12-inch single configuration.	Equipment inventory listing[12]
    Clean Track Lithius Resist Coater / Developer — 12" Multi	—	—	12-inch multi configuration.	Equipment inventory listing[13]

14. 

    Clean Track Mark 5

    Tokyo Electron Clean Track Mark 5 coater described as a single coater with 3 pump dispensers, 2 hot plates, 2 cold plates, and one unknown station.

15. Clean Track Mark 7

    The Tokyo Electron Clean Track Mark 7 is a coater/developer platform for semiconductor wafers, also used as the basis for the SS-series stand-alone scrubber system.

    Cited variants

    Designation	Generation	Vintage	Changes	Source
    SS-series	—	—	Stand-alone wafer scrubber system based on the CLEAN TRACK MARK 7 platform with features including vacuumless robotic transport, mechanical and vacuum chucks, automatic brush pressure controller, optional jet or megasonic cleaning.	web.archive.org[14]

16. 

    Clean Track Mark 8

    Tokyo Electron Clean Track Mark 8 is a coater/developer system stated to be configured for 8-inch wafers.

17. Clean Track Mark 8 Resist

    The Tokyo Electron Clean Track Mark 8 is a resist coater and developer for 8-inch wafers.

18. 

    Clean Track Mark 8 Track

    The Tokyo Electron Clean Track Mark 8 Track is a coater/developer track system for wet processing in semiconductor manufacturing.

Sources