Tokyo Electron
Clean Track Mark 5
The Tokyo Electron Clean Track Mark 5 is a coater from 1992. The Mark 5 has a single coater, three pump dispensers, two hot plates, two cold plates, and one unknown station.[1]
What it is
General reference — not yet source-verifiedThe Clean Track series of tools perform spin-coating of photoresist onto wafers as part of the lithography cycle.
How it works
General reference — not yet source-verifiedWafer processing on a Clean Track system begins with automated loading and centering of a wafer on a spin chuck.
A precisely controlled volume of liquid photoresist is dispensed onto the wafer while it rotates, spreading the resist into a uniform film by centrifugal force.
Where it fits in the process flow
General reference — not yet source-verifiedThe Clean Track Mark 5 operates in the photolithography sequence immediately after wafer cleaning and dehydration bake and before exposure in a stepper or scanner.
Applications
General reference — not yet source-verifiedThe Clean Track Mark 5 is used to coat semiconductor wafers with photoresist for pattern transfer in front-end-of-line and back-end-of-line layers.
What do the numbers mean?
Vacuum & pumping2
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Clean Track Mark 5 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Clean Track Mark 5 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Clean Track Mark 5 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Clean Track Mark 5 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track Mark 5 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track Mark 5 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Sep 22, 2026.
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