Veeco

The Veeco LSA101 is a Laser Spike Annealing System used for precision doping of materials at a controlled temperature in semiconductor manufacturing.

Veeco / SSEC Waferstorm 3300 / M 3303 / M 3304 is a single wafer processing system for 6-inch wafers.

The Veeco / Wyko NT 9800 Optical Profilometer is an optical profilometer identified with a single-phase, 50/60 Hz, 115/230 V, 375 VA power specification.

The Veeco Nexus IBE350 is a broad-beam ion etcher with a 350 mm Argon ion source, three-grids ion optics, and SIMS endpoint detection.

Veeco Dektak 150 is a stylus-based surface profiler used for measuring surface topography and thin film step heights.

Veeco Spector Bare is a bare chamber described as including a frame and having no parts inside the chamber.

The Veeco NT 2000 Automatic Optical is an automatic optical tool classified under Metrology & Inspection.

The Veeco E 450 is a chemical vapor deposition (CVD) system.

Veeco WaferStorm 3303 is an automated solvent processor with a 300mm FOUP load port, wafer mapping and RFID reader, and robotic handling for 200/300mm wafers.

The Veeco K 465 i is a GaN MOCVD (metal organic chemical vapor deposition) system.

The Veeco K 475 is a Metal Organic Chemical Vapor Deposition (MOCVD) system designed for thin-film deposition processes.

The Veeco Spector is an ion beam deposition (IBD) system.

The Veeco / SSEC ML 3300 is a single wafer cleaner that accommodates 8 inch wafers.

Veeco Julabo TCU 1 High Precision Heat Exchanger operates at 380V, 50/60 Hz, 14A, 3 phase, with 9 kW heating capacity and a working temperature range of 30 to 225 °C.

The Veeco E 400 is an MOCVD (Metal Organic Chemical Vapor Deposition) reactor produced by Veeco and categorized as semiconductor deposition equipment.

The Veeco DiInnova 840 012 711 is an atomic force microscope (AFM) used in metrology and inspection.

The Veeco / SSEC Waferstorm M 3305 is a lift off machine.

The Veeco Savannah G 2 is an atomic layer deposition tool for ALD thin-film deposition.

The Veeco XLD is an atomic force microscope (AFM) used for metrology and inspection, supporting 300 mm (12 inch) wafers.

The Veeco Waferstorm M 3303 is a single wafer processing system.

Veeco TurboDisc K 465 GaN MOCVD is a metal organic chemical vapor deposition system.

The Veeco / Wyko NT 3300 is a metrology/profilometer system with a 200 mm stage.

The Veeco KS 1100 is a profilometer used for metrology and inspection.

The Veeco RF 350 Ion Beam is an automated, single-substrate loadlocked production system designed for ion beam etching.

The Veeco 4-point probe measures sheet resistance and material resistivity of semiconductor wafers and resistive films.

The Veeco V 220 SI Surface is a surface profilometer for 8-inch wafers.

The Veeco RF 16 cm Ion Source Body is an ion source body from Veeco, with the model designation RF 16 cm.

The Veeco NT 8100 Automatic Optical is an automatic optical profilometer used for metrology and inspection.

The Veeco / SSEC F 4 VCO 529 Vapor Phase Chemical Oxidation System (VPCO) is a vapor phase chemical oxidation tool categorized under Thermal / Diffusion.

The Veeco K 465 MOCVD Reactor is used for metal organic chemical vapor deposition.

The Veeco / SSEC 3303 Lift Off Machine is a lift-off process machine for 6-inch wafers.

The Veeco Waferstorm 3300 / M 3303 / M 3304 Process Bench is a process bench used in semiconductor manufacturing.

The Veeco HD 3300 is a profilometer used for metrology and inspection.

The Veeco OSP 1100 is a contact profilometer used for surface profile measurement.

The Veeco / Wyko NT 3300 Optical is an automated optical 3D profiling system intended for measuring a wide variety of surfaces and samples.

The Veeco GXRS System XR is an X-ray thickness and composition measurement tool.

The Veeco / Digital Instruments DUVX 200 is an atomic force microscope (AFM) and belongs to the Metrology & Inspection category.

The Veeco / Wyko NT 3300 SU is a 2D/3D profiler with a 6-inch or 8-inch stage, motorized XYZ, motorized turret, auto focus, stitching, and full automation capability.

The Veeco K 465 is a metal organic chemical vapor deposition (MOCVD) system.

The Veeco RF 350 S is a one-chamber ion mill configured with argon gas and Windows 2000.

The Veeco RFS-O-11 Atomic Oxygen Plasma Source is a component designed for use in custom MBE systems.

The Veeco Four Point Probe is used for measuring resistivity and calculating sheet resistance of semiconductor samples.

The Veeco FPP-5000 is a four-point probe used for electrical testing.

The Veeco Wyko-NT9800 is a metrology tool listed in an equipment-rate schedule.

The Veeco RF 350 is an ion beam etching system used in semiconductor manufacturing.

The Veeco AP 300 E Lithography System is a lithography tool with 2.0 µm resolution, extended-field ghi-line broadband optics, and handling features for 200 mm and 300 mm wafers including warped wafer handling to 500 µm.

The Veeco / Wyko NT 9100 is a Surface Profiler.

The Veeco / SSEC Waferstorm M 3308 12 is a single wafer processing system for 6-inch wafers.

Veeco IBS-2 Ion Beam Deposition (IBD) is a deposition system with 6-inch wafer size support.

The Veeco NT 9100 is a non-contact optical profilometer for surface metrology and surface analysis.

General referenceVeeco K 465 GaN MOCVD is a metal-organic chemical vapor deposition system for depositing compound semiconductor thin films. Machines of this class are used to grow epitaxial layers from reactive vapor precursors in a controlled reactor environment.