Waferpedia

Axcelis

GSD 200 E 2 Ion

Ion ImplantationAxcelis GSD 200 family
Research Quality: 50% complete

The Axcelis GSD 200 E 2 Ion is an ion implanter. The Axcelis GSD 200 E 2 Ion is configured for 6 inch wafers. The Axcelis GSD 200 E 2 Ion includes high-current GSD-200EE configuration with 4-cassette capability.[1][2]

GSD 200 E 2 Ion — Inventory photo
Fig. 01GSD 200 E 2 IonInventory photo[1]

Vacuum

Beamline and Source Pumps[1]

Gas delivery

MFC Type and Model[1]

What it is

The Axcelis GSD 200 E 2 Ion is an ion implanter used in semiconductor fabrication.[1][2]

The GSD 200 E 2 Ion is an Axcelis GSD 200 family tool.[2]

How it works

The Axcelis GSD 200 E 2 Ion includes automated beam tuning and set-up with Eaton Autotune, a GEM/SECS interface, and an enhanced low-energy beamline.[1][2]

Where it fits in the process flow

The Axcelis GSD 200 E 2 Ion supports wafer handling with 4-cassette capability and automatic flat or notch alignment with a buffer cassette.[1][2]

Applications

The Axcelis GSD 200 E 2 Ion is configured as a high-current tool with a single-stage extraction of 90 keV and an energy range of 90 keV.[1][2]

What do the numbers mean?

Vacuum & pumping6

Beamline and Source Pumps[1]
Accurate?
Source Turbo Pump (P1)
STP H2000C[1]
Accurate?
Beam Line Cryo Pump (P3)
CTI Onboard 10[1]
Accurate?
End Station Cryo Pump (P2)
CTI Onboard 8[1]
Accurate?
Beamline and source pumps
Beamline and Source Pumps[2]
Accurate?
Cryo Compressors
CTI 9600 (1)[1]
Accurate?

Wafer handling4

4-Cassette Capability[1]
Accurate?
Automatic Flat or Notch Alignment Capability w/buffer cassette[1]
Accurate?
Wafer size
6 inch[1]
Accurate?
Cassette capability
4-cassette capability[1]
Accurate?

Gas & chemistry1

Gas Type
MFC Type and Model[1]
Accurate?

Control & software4

Software Version 6.12.3[1]
Accurate?
GEM/SECS Interface[1]
Accurate?
Software version
6.12.3[1]
Accurate?
GEM/SECS interface
Present[1]
Accurate?

Dimensions & facilities1

External Facilities Connections
Ar N2[1]
Accurate?

Configuration & options23

High Current
GSD-200EE[1]
Accurate?
Automated Beam tuning and Set-Up w/Eaton Autotune[1]
Accurate?
Ion Source Type
ELS[1]
Accurate?
Source Material Type
Moly[1]
Accurate?
Signal Tower[1]
Accurate?
Flag Faraday Injector[1]
Accurate?
Direct Rotory Drive[1]
Accurate?
Enhanced Low Energy Beamline[1]
Accurate?
Process Disk w/Active Cooling & Chiller[1]
Accurate?
Single Stage Extraction
90keV[1]
Accurate?
Beamline Version
Standard[1]
Accurate?
Block Upgrade[1]
Accurate?
Manufacturer
Axcelis[1]
Accurate?
Model
GSD 200 E 2[1]
Accurate?
Category
Ion Implantation[2]
Accurate?
High Current GSD-200EE[2]
Accurate?
Automated beam tuning and set-up
w/Eaton Autotune[1]
Accurate?
Energy range
90KeV[1]
Accurate?
Ar
UNIT 1662 10SCCM - SDS[1]
Accurate?
BF3
UNIT 1662 10SCCM - SDS[1]
Accurate?
AsH3
UNIT 1662 10SCCM - SDS[1]
Accurate?
PH3
UNIT 1660 10SCCM - SDS[1]
Accurate?
Remote Disk Chiller
SMC-HRS050[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationBeamline and Source Pumps[1]
  • Source Turbo Pump (P1)STP H2000C[1]
  • Beam Line Cryo Pump (P3)CTI Onboard 10[1]
  • End Station Cryo Pump (P2)CTI Onboard 8[1]
  • Beamline and source pumpsBeamline and Source Pumps[2]
  • Gas TypeMFC Type and Model[1]
  • Cryo CompressorsCTI 9600 (1)[1]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the GSD 200 E 2 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the GSD 200 E 2 Ion are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the GSD 200 E 2 Ion are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the GSD 200 E 2 Ion are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the GSD 200 E 2 Ion are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the GSD 200 E 2 Ion is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
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Last updated Oct 10, 2026.

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