Edwards
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The Edwards IXH 610 is a dry vacuum pump. The Edwards IXH 610 is built for harsh chemical applications in semiconductor processing. The Edwards IXH 610 has a peak pumping speed of 665 m3/h and an ultimate pressure of 3.7 x 10-3 Torr.[1][2]
The Edwards IXH 610 is used with load lock, transfer, metrology, lithography, physical vapor deposition, pre-clean, rapid thermal processing, strip and ash, etching, implant source, high-density plasma chemical vapor deposition, sub-atmospheric chemical vapor deposition, tungsten chemical vapor deposition, plasma-enhanced chemical vapor deposition, and low pressure chemical vapor deposition applications.[1][4][2]
The Edwards IXH 610 is used for harsh chemical processes in semiconductor manufacturing.[1]
The Edwards IXH 610 is applied in chemical vapor deposition, plasma-enhanced chemical vapor deposition, low pressure chemical vapor deposition, high-density plasma chemical vapor deposition, rapid thermal processing, lithography, physical vapor deposition, pre-clean, load lock, transfer, metrology, strip and ash, etching, and implant source service.[1][4][2]
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The Edwards IXH 610 is a pump.[3]
The following facts about the IXH 610 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the IXH 610 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the IXH 610 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the IXH 610 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the IXH 610 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the IXH 610 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 11, 2026.