Oxford Instruments
PlasmaPro 100 Cobra ICP-RIE
The PlasmaPro 100 Cobra ICP-RIE is an Oxford Instruments inductively coupled plasma reactive ion etch system. The PlasmaPro 100 Cobra ICP-RIE is configured for 6" substrates. The PlasmaPro 100 Cobra ICP-RIE supports wafer sizes up to 200mm.[1][2][3]
Power
208 V, 3 Phase, 50/60 Hz[1]
Vacuum
Pfeiffer Adixen A 124 H Vacuum Pump[1]
Performance
fast etch rates[3]
Gas delivery
Gas Box[1]
What it is
The Oxford Instruments PlasmaPro 100 Cobra is an inductively coupled plasma reactive ion etch (ICP-RIE) system. The system is operated at 208 V, three-phase, 50/60 Hz and is configured for 6-inch substrates. The system includes an Advanced Energy Paramount MF 5003 RF generator, Pfeiffer Adixen Magpower turbopump controller, Pfeiffer Adixen A 124 H vacuum pump, Pfeiffer Adixen ZCP 15 G vacuum pump, a gas box, and a control computer with LCD monitor. The control computer runs OS PTIQ version 2021.12.2.0.[1]
How it works
General reference — not yet source-verifiedEtching systems of this class operate inside a vacuum chamber where a controlled mixture of process gases is introduced. Radio frequency power is applied to a coil to sustain the inductively coupled plasma, while a separate RF bias on the substrate stage controls ion energy. The combination of high plasma density and independent ion energy control allows precise etching of a wide range of materials. The system is housed in a cleanroom environment and typically includes automated process control for repeatable etching conditions.
What do the numbers mean?
Power & electrical5
- Advanced Energy paramount MF 5003 RF Generator[1]
- Included components (example configuration)
- Advanced Energy paramount MF 5003 RF Generator; Pfeiffer Adixen Magpower Turbopump Controller; Pfeiffer Adixen A 124 H Vacuum Pump; Pfeiffer Adixen ZCP 15 G Vacuum Pump; Gas Box; Control Computer & LCD Monitor with OS PTIQ Version 2021.12.2.0[1]
- Upgrades/accessories available
- Dry pump N2 standby, gas pod, Logviewer software, optical end point detectors, soft pump, turbomolecular vacuum pump, X20 Control System, Advanced Energy Paramount generator, automatic pressure control, dual CM gauge switching, LN2 autochangeover, TEOS liquid level sensing[2]
Vacuum & pumping3
Wafer handling7
Gas & chemistry2
- Gas Box[1]
Performance2
- Process characteristics
- excellent uniformity, high-throughput, high-precision and low-damage processes[3]
Control & software1
- Control Computer & LCD Monitor[1]
Configuration & options7
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Voltage208 V, 3 Phase, 50/60 Hz[1]
- ConfigurationAdvanced Energy paramount MF 5003 RF Generator[1]
- ConfigurationPfeiffer Adixen Magpower Turbopump Controller[1]
- ConfigurationPfeiffer Adixen A 124 H Vacuum Pump[1]
- ConfigurationPfeiffer Adixen ZCP 15 G Vacuum Pump[1]
- ConfigurationGas Box[1]
- Etch chemistriesSF6, CHF3, CF4, O2[4]
- Electrical requirements208 V, 3 phase, 50/60 Hz[1]
- Included components (example configuration)Advanced Energy paramount MF 5003 RF Generator; Pfeiffer Adixen Magpower Turbopump Controller; Pfeiffer Adixen A 124 H Vacuum Pump; Pfeiffer Adixen ZCP 15 G Vacuum Pump; Gas Box; Control Computer & LCD Monitor with OS PTIQ Version 2021.12.2.0[1]
- Upgrades/accessories availableDry pump N2 standby, gas pod, Logviewer software, optical end point detectors, soft pump, turbomolecular vacuum pump, X20 Control System, Advanced Energy Paramount generator, automatic pressure control, dual CM gauge switching, LN2 autochangeover, TEOS liquid level sensing[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the maximum wafer size the PlasmaPro 100 Cobra can process?
The PlasmaPro 100 Cobra supports wafer sizes up to 200 mm.[3]
What applications is the PlasmaPro 100 Cobra designed for?
The system supports GaAs and InP laser optoelectronics, SiC and GaN power electronics/RF, and MEMS and sensors.[3]
What are the electrical requirements of the PlasmaPro 100 Cobra?
The system runs on 208 V, three-phase, 50/60 Hz power.[1]
What is the substrate size configuration of the PlasmaPro 100 Cobra?
The system is configured for 6-inch substrates.[1]
Not publicly documented
The following facts about the PlasmaPro 100 Cobra ICP-RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PlasmaPro 100 Cobra ICP-RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the PlasmaPro 100 Cobra ICP-RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]nanovactech.com — nanovactech.comnanovactech.com
- [3]facebook.com — facebook.comfacebook.com
- [4]ece.utoronto.ca — ece.utoronto.caece.utoronto.ca
Last updated Oct 3, 2026.
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