Waferpedia

Temescal

TES 900

DepositionTemescal TES 900 family
Research Quality: 50% complete
TES 900 — tescal.com
Fig. 01TES 900tescal.com[1]

What it is

The Temescal TES 900 is a vertical-process sputtering system within the TES 600/900 series. The system uses a fast cycle dual level load lock that exchanges a completed 12-inch by 12-inch pallet load of substrates with a new pallet load. The pallet travels in a linear motion in front of up to three 5-inch by 15-inch magnetron cathodes. Substrate deposition uniformity of plus or minus five percent is achievable. RF etch and substrate heating are performed in the process chamber.[1]

How it works

The TES 900's pallet scans in front of its rectangular magnetron cathodes to deposit material. The dual level load lock allows continuous operation by exchanging a completed pallet with a new one.[1]

Where it fits in the process flow

General reference — not yet source-verified

Sputtering deposition is typically performed after substrate cleaning and surface preparation and before subsequent photolithography or etching steps. Sputtering is often used to deposit metal layers such as aluminum, titanium, and tungsten, as well as dielectric films.

Applications

General reference — not yet source-verified

Sputtering systems are used to deposit thin films for microelectronics, optical coatings, and wear-resistant layers. Typical deposited materials include metals, metal oxides, and nitrides.

What do the numbers mean?

Power & electrical1

In-situ capabilities
RF etch and substrate heating in process chamber[1]
Accurate?

Wafer handling4

Substrate orientation
Vertical[1]
Accurate?
Load lock type
Fast cycle dual level load lock[1]
Accurate?
Substrate carrier size
12" x 12" pallet[1]
Accurate?
Substrate motion
Linear scanning in front of cathodes[1]
Accurate?

Performance1

Deposition uniformity
±5%[1]
Accurate?

Configuration & options3

Process type
Sputtering[1]
Accurate?
Number of cathodes
Up to three[1]
Accurate?
Cathode size
5" x 15" magnetron cathodes[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What replaced it?

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • In-situ capabilitiesRF etch and substrate heating in process chamber[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What substrate size does the TES 900 support?

The TES 900 uses a 12-inch by 12-inch pallet for substrates.[1]

How many magnetron cathodes can be installed in the TES 900?

The system can be configured with up to three 5-inch by 15-inch magnetron cathodes.[1]

Does the TES 900 process chamber include additional capabilities?

RF etch and substrate heating are performed in the process chamber.[1]

How does the load lock contribute to operation of the TES 900?

The dual level load lock allows continuous operation by exchanging a completed pallet with a new one.[1]

Not publicly documented

The following facts about the TES 900 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TES 900 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the TES 900 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the TES 900 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the TES 900 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the TES 900 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]tescal.com — tescal.comtescal.com
Was this page accurate?

Last updated Oct 3, 2026.

Compare with similar tools

View all →