Ultratech

1500

Lithography Wafer loader Ultratech 1500 family

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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Ultratech 1500 is a stepper used for photolithography. The Ultratech 1500 operates with broadband illumination and has a numerical aperture of 0.32. The Ultratech 1500 processes 6-inch wafers and includes a wafer loader.^[1]

1500 — Inventory photo — Fig. 011500Inventory photo^[1]

Wafer size

Wafer loader

Power

50/60 Hz^[1]

Optics

0.32 NA^[2]

How it works

The Ultratech 1500 uses g-line and h-line wavelengths for exposure.^[4]^[3]^[5]

What do the numbers mean?

Power & electrical4

50/60 Hz^[1]; 12 Amp^[1]
Power: 50/60 Hz, 12 Amp^[1]
Power: 12 Amp, 50/60 Hz^[1]

Wafer handling3

Wafer size: Wafer loader^[1]
Wafer size: 6 inch^[1]
Wafer loader: Yes^[1]

Optics & imaging5

Numerical aperture: 0.32 NA^[2]
Exposure source: Broadband, gh-line^[2]
Illumination: Broadband^[2]
Numerical aperture: 0.32^[2]
Illumination: g/h-line^[3]

Configuration & options1

Vintage: 2000^[1]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Configuration50/60 Hz^[1]
Configuration12 Amp^[1]
Power50/60 Hz, 12 Amp^[1]
Power12 Amp, 50/60 Hz^[1]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

AZ 3312 full data sheetDatasheetasu.edu
AZ4620Documentucsb.edu
AZ P4620Documentucsb.edu
AZ10XT_Photoresist_comparing_AZ9260.pdfDocumentduke.edu
AZ P4620 data packageDocumenttamu.edu

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Not publicly documented

Field notes

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Frequently asked questions

Has the Ultratech 1500 been used with AZ P4620 photoresist?

Yes, the Ultratech 1500 has been used to expose AZ P4620 photoresist at film thicknesses of 12 μm and 24 μm.^[4]^[5]

What developer processes are used with the Ultratech 1500 for thick photoresist?

For AZ P4620 at 12 μm thickness, development used AZ 300 MIF continuous spray for 200 seconds at 23°C. At 24 μm thickness, development used AZ 400K 1:4 continuous spray for 260 seconds at 27°C.^[4]^[5]

What are typical exposure doses for thick photoresist on the Ultratech 1500?

For AZ P4620 at 12 μm thickness, the dose-to-print for 10 μm dense lines was 893 mJ/cm². At 24 μm thickness, the dose-to-print was 1742 mJ/cm².^[4]^[5]

Not publicly documented

The following facts about the 1500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1500 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 1500 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report