Ontrak
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The Ontrak DSS 200 Post is a double-sided PVA scrubber. The Ontrak DSS 200 Post is used for post-CMP cleaning and related wafer-cleaning applications. The Ontrak DSS 200 Post is configured for wafers from 100mm to 200mm.[1][2][3]

The Ontrak DSS 200 Post is a post-CMP wafer cleaner in the OnTrak DSS 200 family. The tool is a double-sided PVA scrubber for semiconductor wafer cleaning.[1][9][3]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Ontrak DSS200 Series 1 | — | — | Designed to clean 100mm to 200mm wafers and has a universal load station. | axustech.com[2] |
| Ontrak DSS200 Series 2 | — | — | Offers production-proven cleaning results, throughputs of 45-65 wafers per hour, and a 200mm ergonomic load station. | axustech.com[1] |
| DSS-200 Series 1 | — | — | Designed to clean 100mm to 200mm wafers; standard features include universal load station, double-sided PVA scrub, dual brush boxes, ammonia dispense, IR assisted spin dry station, robotic unload, vertical unload station, touchscreen controls. | axustech.com[2] |
| DSS-200 Series 2 | — | — | Double-sided PVA scrubber offering 45-65 wafers per hour throughput; 200mm ergonomic load station, dark plastic covers protect light sensitive wafers, dual brush boxes, ammonia dispense, IR assisted spin dry station, robotic unload, vertical unload station, touchscreen controls. | axustech.com[1] |
| DSS-200 CE | — | — | Entrepix table lists Entrepix Series 2 CE with brush scrub, roller PVA brush, downforce control, optional edge scrub, optional MegPie megasonic transducer, optional megasonic nozzle, optional high-pressure DI water spray, optional heated DI water feed, spin + heat lamp drying, NH4OH, dHF, SC-1 pre-diluted, SC-2 citric-based, backside chemical, metal CMP cleans, STI CMP cleans. | entrepix.com[9] |
| Entrepix Synergy | — | — | Entrepix table lists Synergy with brush scrub, roller PVA brush, downforce control, optional accessories, spin + heat lamp drying, NH4OH, dHF, SC-1 pre-diluted, SC-2 citric or HCL-based, backside chemical, metal CMP cleans, STI CMP cleans. | entrepix.com[9] |
| Entrepix Integra | — | — | Entrepix table lists Integra with integrated cleaning, brush scrub, roller PVA brush, downforce control, optional accessories, spin + heat lamp drying, NH4OH, dHF, SC-1 pre-diluted, SC-2 citric or HCL-based, backside chemical, metal CMP cleans, STI CMP cleans, double contained process area. | entrepix.com[9] |
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The following facts about the DSS 200 Post are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the DSS 200 Post are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the DSS 200 Post are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the DSS 200 Post are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the DSS 200 Post is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the DSS 200 Post are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Oct 11, 2026.
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